microwave device

Reactive ion beam etching technique has been effectively used to study and fabricate large-scale and ultra large scale integrated circuit, acoustic surface wave device, magnetic bubble device microwave device, integrated optical circuit, superconducting device, shimmer optical pattern etc.

反应离子束刻蚀技术已有效地用于研究和制造大规模和超大规模集成电路，声表面波器件，磁泡存储器，微波器件，集成光路，超导器件，闪烁光栅等。

Subnanosecond millimeter relativistic backward wave oscillator, based on superradiance mechanism, was a novelty microwave device developed in last few years.

基于超辐射机理的亚纳秒毫米波微波器件是近几年发展起来的一种新型微波器件，其辐射功率与参与束波互作用的电子束密度的平方成正比关系。